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µ-NLO: versatile µ-imprinting process of second order non linear optical properties in glasses

Domaines Sécurité
Habitat
Energie
Mobilité
Numérique

Technologie Fabrication additive

Applications

This versatile µ-imprinting process of second order Non Linear Optical (NLO) properties in glasses will find applications in :

  • Photonic integrated circuit (PIC)
  • Electro optic components
  • χ(2) Nonlinearity Conversion

Description

Our technology is an imprinting method allowing to structure, at multiple scales, the second order non linear (SONL) optical properties of amorphous materials.

The optical elements are formed directly on a wide variety of vitreous compositions and are capable of Second Harmonic Generation (SHG).

    Micrometric localization of the electro-optical anisotropy

 

Periodical and long range χ(2)  structuring : a SONL grating

Benefits

  • Large variety of micrometric structures (dots, squares, lines…), on demand.
  • Long range χ(2) structuring (cm²).
  • Large variety of glasses.

Inventeurs

Marc DUSSAUZE

Vincent RODRIGUEZ

Frédéric ADAMIETZ

Institute of Molecular Sciences (ISM, UMR 5255)

 

Thierry CARDINAL

Evelyne FARGIN

Institute for Solid State Chemistry Bordeaux  (ICMCB, UPR 9048)

Propriété intellectuelle

Patent application: WO 2016/177818 A1

Contact

Matthieu Ayfre
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