µ-NLO: versatile µ-imprinting process of second order non linear optical properties in glasses
Domaines
Sécurité
Habitat
Energie
Mobilité
Numérique
Technologie Fabrication additive
Applications
This versatile µ-imprinting process of second order Non Linear Optical (NLO) properties in glasses will find applications in :
- Photonic integrated circuit (PIC)
- Electro optic components
- χ(2) Nonlinearity Conversion
Description
Our technology is an imprinting method allowing to structure, at multiple scales, the second order non linear (SONL) optical properties of amorphous materials.
The optical elements are formed directly on a wide variety of vitreous compositions and are capable of Second Harmonic Generation (SHG).
Micrometric localization of the electro-optical anisotropy
Periodical and long range χ(2) structuring : a SONL grating
Benefits
- Large variety of micrometric structures (dots, squares, lines…), on demand.
- Long range χ(2) structuring (cm²).
- Large variety of glasses.
Inventeurs
Marc DUSSAUZE
Vincent RODRIGUEZ
Frédéric ADAMIETZ
Institute of Molecular Sciences (ISM, UMR 5255)
Thierry CARDINAL
Evelyne FARGIN
Institute for Solid State Chemistry Bordeaux (ICMCB, UPR 9048)
Propriété intellectuelle
Patent application: WO 2016/177818 A1
Contact
Matthieu Ayfre
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